Nanotronics launches nSPEC automated wafer inspection system
At the recent 2011 International Conference on Compound Semiconductor Manufacturing Technology (CS Mantech) exhibition in Palm Springs, CA (16–19 May), Nanotronics Imaging LLC of Cuyahoga Falls, OH, USA launched nSPEC, a fully automatic inspection system for analyzing transparent and semi-transparent wafers for defects.
Proprietary software and hardware underlying nSPEC enable rapid and detailed analysis of wafer defects. Nanotronics employs ‘Point and Shoot’ microscopy, as it aims to eliminate a learning curve for users while giving accurate and easy-to-interpret data. The reports of defect classification and mapping may be custom configured or selected from the provided report templates and library of standard defects. Reports may include density maps, histograms, defect count and applicable statistics, all of which can be configured for the user's specific requirements.
Nanotronics says that the inspection system allows easy set up for repeated quality control testing, but can be set for single image capture or scans. Configuration options include wafer size, type of defects to be identified, and resolution of scan. Various sample chucks are available to meet specific needs. Complete system automation with cassette-to-cassette loading of 2–8” wafers is available.
Nanotronics Imaging also announced the recruitment of new executive vice president Ivan Eliashevich (formerly director, sales & business development at epiwafer foundry and substrate maker IQE), who brings a level of expertise in the semiconductor industry that is unique, the firm reckons. “I knew Ivan as a client, who helped me to understand wafer technology,” says CEO & founder Matthew Putman. “He is honest, knowledgeable, and a powerful proponent for the customer and supplier,” he adds.